Heterogeneous 3D CFET with Hybrid Channel Configuration

  • Kim, Sanghyeon; 
  • Kim, Seongkwang; 
  • Lim, HyeongRak; 
  • Jeong, Jaeyong; 
  • Park, Youngkeun; 
  • ... Geum, Daemyeong; 
  • 외 5명
Citations

WEB OF SCIENCE

2
Citations

SCOPUS

2

초록

Complementary field-effect transistors (CFETs) have been seriously studied for next-generation device architectures to improve PPA (power, performance, and area). However, many challenges remain, including process integration, structure optimization, implementation schemes (monolithic/sequential), etc. At the transistor level, unbalanced transport between n- and p-FET would be one of the most critical issues because CFETs inherently require the same width both for n- and p-FETs. Furthermore, new parameters such as spacing length between top and bottom FETs have emerged. Here, we discuss the opportunity for heterogeneous channel design to mitigate these issues.

키워드

CFET; Si/Ge; Wafer bonding
제목
Heterogeneous 3D CFET with Hybrid Channel Configuration
저자
Kim, Sanghyeon; Kim, Seongkwang; Lim, HyeongRak; Jeong, Jaeyong; Park, Youngkeun; Jeong, Jaejoong; Kim, Joonpyo; Kim, Bongho; Geum, Daemyeong; Kim, Younghyun; Cho, Byung Jin
DOI
10.1109/EDTM61175.2025.11041288
발행일
2025
유형
Proceedings Paper
저널명
2025 9TH IEEE ELECTRON DEVICES TECHNOLOGY & MANUFACTURING CONFERENCE, EDTM