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Etch Characteristics of Nickel Oxide and Nickel Using Inductively Coupled Plasma Reactive Ion Etching for Oxide Resistive Random Access Memory(OxRRAM) Application
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- Etch Characteristics of Nickel Oxide and Nickel Using Inductively Coupled Plasma Reactive Ion Etching for Oxide Resistive Random Access Memory(OxRRAM) Application
- 저자
- CHUNG CHEE WON
- 학회명
- Proceedings of International Symposium on Dry Process