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Low-temperature growth of rutile TiO2 using a SnO2 seed layer for high-k dielectric applications in DRAM devices
- 제목
- Low-temperature growth of rutile TiO2 using a SnO2 seed layer for high-k dielectric applications in DRAM devices
- 저자
- In-Hwan Baek
- 학회명
- The 40th international technical conference on circuits/systems, computers, and communications 2025
- 개최지
- 중앙대학교