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Etch characteristics of Cu thin film using inductively coupled plasma of non-greenhouse gases
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- Etch characteristics of Cu thin film using inductively coupled plasma of non-greenhouse gases
- 저자
- CHUNG CHEE WON
- 학회명
- 233rd ECS meeting
- 개최지
- Seattle, WA, US
- 학회 개최일
- 2018-05-13 ~ 2018-05-17