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자료 필터
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2018 ~ 2026
2018 2026
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선택된 필터
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전체 27건 중 21번부터 27번까지의 결과를 표시합니다.
2019
Article
Etch Characteristics of Micrometer-Scale Masked Cu Thin Films Using Inductively Coupled Plasma of H2/Ar
- Choi, Jae Sang ;
- Cho, Doo Hyeon ;
- Lim, Eun Taek ;
- Chung, Chee Won
- 2019-10
- Journal of Nanoscience and Nanotechnology
- AMER SCIENTIFIC PUBLISHERS
Article
Evolution of etch profile of copper thin films in high density plasmas of alcohol-based gases
- Lim, Eun Taek ;
- Ryu, Jin Su ;
- Choi, Jae Sang ;
- Chung, Chee Won
- 2019-09
- Vacuum
- PERGAMON-ELSEVIER SCIENCE LTD
Article
Preface proceedings of the 7th International Conference on Microelectronics and Plasma Technology (ICMAP 2018), Incheon, Korea
- Lee, Nae-Eung ;
- Chae, Hee Yeop ;
- Chung, Chee Won ;
- Kim, Hyun Woo ;
- Kim, Hyoung Sub ;
- 외 7명
- 2019-06-30
- Thin Solid Films
- ELSEVIER SCIENCE SA
Article
Dry etching of copper thin films in high density plasma of CH3COOH/Ar
- Ryu, Jin Su ;
- Lim, Eun Taek ;
- Choi, Jae Sang ;
- Chung, Chee Won
- 2019-02-28
- Thin Solid Films
- ELSEVIER SCIENCE SA
2018
Article
Etch characteristics of copper thin films in high density plasma of CH4/O2/Ar gas mixture
- Lim, Eun Taek ;
- Ryu, Jin Su ;
- Chung, Chee Won
- 2018-11-01
- Thin Solid Films
- ELSEVIER SCIENCE SA
Article
Nanometer-scale etching of CoFeB thin films using pulse-modulated high density plasma
- Cho, Doo Hyeon ;
- Lee, Jae Yong ;
- Choi, Jae Sang ;
- Chung, Chee Won
- 2018-09
- Current Applied Physics
- ELSEVIER SCIENCE BV
Article
Influence of C2F6 Addition to Cl2/Ar Gas on Nanometer-Scale Etch Characteristics of TiN Thin Films Using Inductively Coupled Plasma
- Choi, Jae Sang ;
- Cho, Doo Hyeon ;
- Lim, Eun Taek ;
- Chung, Chee Won
- 2018
- ECS Journal of Solid State Science and Technology
- ELECTROCHEMICAL SOC INC